RAITH Group

Researchers at TU Berlin and Masaryk University have demonstrated a scalable method for the deterministic fabrication of InGaAs quantum dots (QDs) using the buried stressor technique. Utilizing advanced nanofabrication tools—including electron beam lithography and cathodoluminescence mapping with RAITH E-LINE Plus—the team optimized QD positioning for applications in microlasers and single-photon sources. The work shows how mesa geometry and oxidation profiles can be fine-tuned for enhanced emission properties and QD density control. With emission characterized by μ-PL and photon correlation measurements, the study achieves high single-photon purity suitable for quantum technologies. This research exemplifies how process optimization and modern lithography can push the frontiers of photonic integration. For more details, read the full paper here: https://bit.ly/3JcR4H9

Have you submitted yet? The RAITH Micrograph Award is open, and we’re looking forward to seeing your most impressive SEM images of work created with a RAITH system. What makes this award unique? - It’s not just about the image’s appearance – the science behind the structure is what counts. - Participation is simple: upload 1–3 images and a short description. - Prizes include a fully sponsored trip to a conference of your choice and cash awards for 2nd and 3rd place. Deadline: October 26, 2025 Share your work with the community and gain international visibility: https://bit.ly/435yoQf

We are thrilled to announce our 2025 EBPG User Meetings, which will bring together the brightest minds in electron beam technology across the United States. To reserve your spot, please visit our registration page and choose your preferred event location: https://ow.ly/nxfc50X7QWb Choose the date and location that best suit you... Date: Monday, October 20th, 2025 Location: nano@stanford – Stanford University Date: Wednesday, October 22nd, 2025 Location: The Kavli Nanoscience Institute – California Institute of Technology Date: Friday, October 24th, 2025 Location: Singh Center for Nanotechnology – University of Pennsylvania Each event will feature a full day of programming, typically running from 9 AM to 5 PM, followed by a networking dinner. What to Expect... – Expert Insights: Raith EBPG specialists will showcase the latest features, solutions, and developments. – Tutorials: By popular request, we are excited to introduce valuable instructional sessions this year, led by RAITH experts. – Interactive Discussions: Connect with our support team for assistance with operational, software, and application-related challenges. – Networking Opportunities: Connect with fellow EBPG users and industry professionals. User Contributions: Share your experiences and innovations with the community. Register now and attend for free: https://ow.ly/nxfc50X7QWb

Yesterday, as part of the NRW nano conference in Dortmund, we had visitors from Canada. A delegation of scientists and industry professionals visited our headquarters with representatives from the Economic Development Agency Dortmund. Our CEO, Michael Steigerwald, gave a presentation about our company, which was followed by a tour of our facilities. The visit was a good opportunity to showcase our unique nanotechnology expertise and connect with interesting experts. It was a pleasure to welcome you all to Dortmund!

RAITH’s IONMASTER integrates a magnetic sector SIMS with high-resolution ion microscopy for advanced nanoscale characterization. On October 6th, you have the chance to experience the IONMASTER live in a webinar including a live demo. In this webinar, you will see how the system enables: • Fast switching between different ion species from a single source • Full mass spectra acquisition for every pixel • Nanometer-precise sample positioning with interferometer-controlled stages Make sure to secure your spot now: https://bit.ly/3WfrUKR

Our customers at Stanford University have introduced a novel approach to full-colour 3D augmented reality (AR) displays by integrating inverse-designed metasurface waveguides with AI-driven holography. Their design eliminates bulky optics by embedding high-efficiency, all-glass metasurfaces directly into high-index substrates using a RAITH VOYAGER e-beam lithography system. By avoiding conventional lift-off or physical etching steps, their dry-etching process ensures optical integrity and minimizes surface defects—critical for nanophotonic performance. Combined with a neural network-calibrated wave propagation model, the system produces ultra-realistic 3D holograms. The new approach opens the door for next-generation AR glasses with improved depth cues and compactness. For a deeper dive into this groundbreaking work, read the full article here: https://bit.ly/46rXScR

Join our upcoming webinar to see how RAITH’s IONMASTER combines high-resolution ion microscopy with magnetic sector SIMS to deliver: • Full mass spectrum at each pixel • Instant switching between multiple ion species • Nanometer-accurate sample positioning • Versatile applications from semiconductor research to battery development Plus, watch a live demo with application specialist Alexander Ost. Date: October 6 Time: 10:00 am CEST & 2 PM ET / 11 AM PT Register here: https://bit.ly/46CX4k5

The RAITH Micrograph Award 2025 is open for submission now: Share the work you have fabricated with a RAITH system and win a trip to a conference of your choice or one of our other attractive prizes. To enter the RAITH Micrograph Award, all you have to do is to upload 1-3 SEM images of your work produced using a RAITH system or lithography attachment, describe what the image shows – and that’s it! So take your chance now and don't miss out on this great opportunity. All details can be found on our website: https://bit.ly/47UhjfA

It was great meeting many of you during last week's MNE! We introduced our new E-LINE, now in its fourth generation, to the public, who showed a lot of interest in this multifunctional EBL system. As well as being packed with all the good features you are already familiar with, it now offers even more functionalities and enhanced performance. But that wasn't all. As we do every year, we held our annual User Dinner the day before the MNE, and we enjoyed a lovely evening with some of our customers. On site, the T-shirt campaign, which has become a tradition, was once again a complete success, and we were once again a proud sponsor of the best poster award. All in all, it was a very eventful week, and it was good to see some of you in Southampton. We look forward to next year's edition and hope to see you there!

Meet the new E-LINE 100 – RAITH’s most versatile nanoengineering EBL system, now in its 4th generation. Long known as the “Swiss-army-knife of nanofabrication,” E-LINE has been re-engineered to deliver higher performance and broader functionality: - New FPGA-based 50 MHz / 20-bit pattern generator - Smallest beam size of 1.2 nm in the world for a professional EBL system - Stitching and overlay accuracy improved to 25 nm (mean + 3σ) - Enhanced application-specific features for intuitive use and advanced workflows Multifunctionality along the entire nanofabrication process chain: From lithography to imaging, analysis and modification – all in a single system. And with its open, upgradeable platform, E-LINE continues to evolve with your research. Learn more about the new E-LINE 100: https://bit.ly/46xIpXI