32-sitemicroelectrodemodifiedwithPtblackforneuralrecordingfabricatedwiththin-filmsiliconmembrane资源-CSDN下载

brain-computer

interface;

14 浏览量 2021-02-09 18:35:01 上传评论收藏 839KB PDF 举报

资源推荐

资源详情

资源评论

RESEARCH PAPER

SCIENCE CHINA

Information Sciences

doi: 10.1007/s11432-013-4846-1

 Science China Press and Springer-Verlag Berlin Heidelberg 2013 info.scichina.com www.springerlink.com

32-site microelectrode modiﬁed with Pt black

for neural recording fabricated with thin-ﬁlm

silicon membrane

CHEN SanYuan

, PEI WeiHua

1 ∗

,ZHAOHui

,GUIQiang

, TANG RongYu

CHEN YuanFang

, FANG XiaoLei

,HONGBo

, GAO XiaoRong

& CHEN HongDa

State Key Laboratory on Integrated Optoelectronics, Institute of Semiconductors,

Chinese Academy of Sciences, Beijing 100083,China;

Institute of Neural Engineering, Department of Biomedical Engineering, Tsinghua University,

Beijing 100084,China

Received May 2, 2012; accepted August 9, 2012

Abstract Multi-electrode array is an important tool in the study of neural-network, cognition, remembrance,

as well as brain-computer-interface, etc. Fork-like 32-site microelectrodes are developed with silicon. By use

of integrated circuit technology, the length of the electrodes, the area of the recording sites, as well as the

spaces between the sites are closely controlled. SiO

/SiNx/SiO

composite dielectric membrane and Pt black

are introduced to improve the characteristics of the electrodes. The whole thickness of the thin-ﬁlm probe

was 21 µm. By combining the modifying process with the micro-fabrication method, this kind of silicon based

microelectrode satisﬁes high-density recording and the performance characterization is evaluated by test in vitro

and in vivo.

Keywords microelectrode, brain-computer interface, thin-ﬁlm Si, Pt black, neural recording

Citation Chen S Y, Pei W H, Zhao H, et al. 32-site microelectrode modiﬁed with Pt black for neural recording

fabricated with thin-ﬁlm silicon membrane. Sci China Inf Sci, 2013, 56, doi: 10.1007/s11432-013-4846-1

1 Introduction

Characteristics of silicon-based neural probes such as the length of needles, the area of recording sites

and spacing between the sites can be precisely controlled by MEMS fabricating technology. In addition,

more than one recording site can be arranged on one shank. With these merits, silicon based neural

probes play a very important role in multi-site recording, especially high density recording. A lot of

silicon-based multi-site neural probes have been fabricated with diﬀerent shapes, dimensions and sites

arrangement to satisfy diﬀerent requirements correspondingly [1–5]. In order to achieve high-density

neural signal recording, the area of recording sites should be reduced to similar size of single neuron,

which is on the order of tens of micron [6]. However, along with the decreasing area and increasing

density of recording sites, the impedance characteristics and robustness of the electrode will deteriorate.

∗

Corresponding author (email: [email protected]c.cn)

2 ChenSY,et al. Sci China Inf Sci

Figure 1 Four layers structure of microelectrodes (down to top): substrate layer, lower dielectric layer, metal layer and

upper dielectric layer.

For example, complex wiring layout makes the electrodes vulnerable to leakage [7]. Thermal noise, which

is directly proportional to the impedance, will aﬀect the recording sensitivity or even submerge neuronal

signal. Thus there is an optimization among high-density, sensitivity and robustness.

In this work, a 32-site fork-like neural probe is developed by deep ICP etching combing with SOI

substrate. Compared to boron doping process of deﬁning thickness of Michigan microelectrode [8], SOI

substrate in our process can form an arbitrary thickness by deﬁning device layer thickness. Besides,

both the device layer surface and side remain smooth without changing with the high depth-to-width

ratio of ICP etching, which will reduce damage to brain tissue. Avoiding boron diﬀusion process can

maintain silicon lattice structure and keep the robustness of silicon. A composite membrane composed

of SiO

/SiN

/SiO

is adopted as upper dielectric layer to improve the passivation of dielectric layer and

robustness of the probes. Pt black is modiﬁed on the 30 µm recording sites by electrodeposition to lower

the impedance. Many ways have been used to improve the adhesion between coatings and substrate

situation such as ultrasonication [9] and pulse current [10].

2 Materials and methods

2.1 Design

SOI wafer was used in the fabrication process due to its well-deﬁned thickness of device layer, which

functioned as the substrate of microelectrode [11]. The device was composed by four layers: the substrate

layer which supported all the structures; the lower dielectric layer which insulated the conductive layer

from the substrate; the metal layer as the conductive layer and the upper dielectric layer as insulation

from outside, which can be seen in Figure 1. In order to penetrate into tissues, the microelectrode should

taper toward the tip properly. Four 6 mm-long shanks spacing 285 µm were designed. 8 sites lined up

on each shank and each site was 30 µm in diameter. The spacing between recording sites in one shank

was 200 µm. All the parameters were designed to suit the size and space of neurons.

2.2 Fabrication

A 4-inch double-side polished SOI silicon wafer was used in this study. The thickness of the de-

vice/box/substrate layer is 30/1.5/200 µm. the fabrication process of the microelectrodes was illustrated

in Figure 2 and explained as follows.

Before being applied, the electrode must be packaged to link the minor pad to a common connector.

The electrode was detached from the frame and stuck on a custom made PCB. Gold wire bonding was

used to connect the pads. Silica gel was applied to protect the bond area (Figure 3(b)).

剩余6页未读，继续阅读

评论收藏

内容反馈

weixin_38642864

粉丝: 2

32-site microelectrode modified with Pt black for neural recordi...

最新资源

32-site microelectrode modified with Pt black for neural recordi...

3D Pyramidal Micropool Array Electrode for Amperometric Microsensor

Electrochemical Detection of Nitric Oxide on a SWCNT/RTIL Composite Gel Microelectrode

In-vitro Electrochemical Stability Evaluation of a Flexible MEMS Microelectrode of a Flexible MEMS Microelectrode

行业资料-电子功用-准微电极的制备方法及准微电极在同时检测肾上腺素和尿酸中的应用的说明分析.rar

铂纳米膜修饰金微电极对氧还原React的表面结构敏感电催化活性

在微电极阵列上制备强附着力的铂黑涂层

基于集成芯片的细胞生理多参数自动分析仪.pdf

多种类型的神经芯片的开发

微电极阵列芯片技术研究不同发育阶段C57小鼠心肌细胞的电生理特性.pdf

Qt 5实现串口调试助手 （源工程文件、0积分下载）

AutoSAR标准协议4.2.2

光伏-储能并网系统仿真.rar

XCP协议的规范文档

GD32替换STM32注意事项.pdf

蓝牙BLE协议中文版.pdf

NPPJSONViewer.zip

电路分析基础第二版PDF电子书免费下载

qt样式表一键生成（花狗Fdog）

CANoe通过CAPL脚本实现自动测试

C++和Qt5实践GUI编程指南

C++高性能编程：从入门到精通

Tangent免费.rar

CMSIS-DAP使用说明及驱动.rar

VS2015安装证书，JavaScript_ProjectSystem.msi，JavaScript_LanguageService.msi

Elsevier期刊word模板.zip

BaiduOCR.zip

6、PyTorch 层级结构

最新资源

Qt 5实现串口调试助手（源工程文件、0积分下载）