The document discusses the process of producing silicon wafers for integrated circuits. Single crystal silicon ingots are grown using the Czochralski process, which involves melting high-purity silicon and pulling a seed crystal up slowly to form a cylindrical ingot. The ingot is sliced into thin wafers about 0.75mm thick using diamond cutters. The wafers are polished, etched, and cleaned. They undergo processing such as doping and deposition of materials to build transistors and interconnects. The wafer is diced into individual dies, each containing one copy of the circuit.
We take content rights seriously. If you suspect this is your content, claim it here.
Available Formats
Download as PDF, TXT or read online on Scribd
0 ratings0% found this document useful (0 votes)
47 views23 pages
TN 423: Vlsi Circuits: Silicon Wafers
The document discusses the process of producing silicon wafers for integrated circuits. Single crystal silicon ingots are grown using the Czochralski process, which involves melting high-purity silicon and pulling a seed crystal up slowly to form a cylindrical ingot. The ingot is sliced into thin wafers about 0.75mm thick using diamond cutters. The wafers are polished, etched, and cleaned. They undergo processing such as doping and deposition of materials to build transistors and interconnects. The wafer is diced into individual dies, each containing one copy of the circuit.
We take content rights seriously. If you suspect this is your content, claim it here.
Available Formats
Download as PDF, TXT or read online on Scribd
You are on page 1/ 23
TN 423: VLSI CIRCUITS
Lecture 3
SILICON WAFERS
VLSI CIRCUITS UDOM 1
Silicon Preparations… Crystal Growth ΩEGS has very small impurity levels ΩEGS is polycrystalline material ΩUsed in the preparation of single crystal silicon ΩPolycrystalline silicon rods (EGS) are converted to even purer and defect free single crystals ΩTwo techniques are used in the growth i. Czochralski (CZ) technique ii. Float Zone (FZ) technique
VLSI CIRCUITS UDOM 2
Silicon Preparations… Czochralski (CZ) Process Ω The Czochralski process is a method of crystal growth used to obtain single crystals of semiconductors (e.g), metals (e.g. palladium, platinum, silver, gold), salts and many oxide crystals ( LaAlO3, YAG, .and GGG etc ) Ω Named after J. Czochralski (a Polish Chemist) who determined the crystallization velocity of metals by pulling mono- and polycrystals against gravity out of a melt which is held in a crucible. Ω The most important application may be the growth of large cylindrical ingots, or boules, of single crystal silicon.
VLSI CIRCUITS UDOM 3
Silicon Preparations… Ω The puller consists of three main components: 1. a furnace, which includes a fused-silica crucible, a graphite susceptor, a rotation mechanism (clockwise as shown), a heating element, and a power supply; 2. a crystal-pulling mechanism, which includes a seed holder and a rotation mechanism (counter-Clockwise); and 3. an ambient control, which includes a gas source (such as argon), a flow control and an exhaust system.
VLSI CIRCUITS UDOM 4
Silicon Preparations… Ω A schematic diagram of a Czochralski-Si grower, called puller, is shown.
VLSI CIRCUITS UDOM 5
Silicon Preparations… Ω High-purity, semiconductor-grade silicon (only a few parts per million of impurities) is melted down in a crucible , which is usually made of Quartz.
VLSI CIRCUITS UDOM 6
Silicon Preparations… Ω Dopant impurity atoms such as boron or phosphorus can be added to the molten intrinsic silicon in precise amounts in order to dope the silicon, thus changing it into n-type or p-type extrinsic silicon. Ω This influences the electrical conductivity of the silicon. Ω A seed crystal, mounted on a rod, is dipped into the molten silicon. Ω The seed crystal's rod is pulled upwards and rotated at the same time.
VLSI CIRCUITS UDOM 7
Silicon Preparations… The growth of Silicon crystal depends on ➢ The pulling rate of the seed ➢ Melt temperature ➢ The counter clockwise rotation rate of the seed Ω This process is normally performed in an inert atmosphere, such as argon, and in an inert chamber, such as quartz.
VLSI CIRCUITS UDOM 8
Silicon Wafer Preparations… • Thin silicon wafers are cut from these ingots (typically about 0.75 mm thick) and polished to a very high flatness to be used for creating integrated circuits. •
VLSI CIRCUITS UDOM 9
Silicon Wafer Preparations Crystal Shaping Ω Si crystal obtained from CZ and FZ processes is called an ingot Ω Ingot is hard and brittle Ω Ingots are then shaped and sliced through mechanical processes to form wafers.
VLSI CIRCUITS UDOM 10
Silicon Wafer Preparations… Silicon wafers
VLSI CIRCUITS UDOM 11
Silicon Wafer Preparations… Ω A wafer is a thin slice of semiconductor material, such as a crystalline Silicon, used in electronics for the fabrication of ICs Ω Diamond is used in cutting and shaping Si Ω After cutting and polishing, the Si wafers are packed Ω The packed wafers are ready to be used in the fabrication of ICs VLSI CIRCUITS UDOM 12 Silicon Wafer Preparations… Ω CMOS transistors are fabricated on silicon wafer Ω It is also called a slice or substrate Ω The wafer serves as the substrate for microelectronic devices built in and over the wafer and undergoes many micro fabrication process steps such as ✓ doping or ion implantation, ✓ etching, ✓ deposition of various materials, and ✓ photolithographic patterning. Ω Finally the individual microcircuits are separated (dicing) and packaged.
VLSI CIRCUITS UDOM 13
Silicon Wafer Preparations… Ω A wafer is the base material for IC manufacturing process Ω Diameter of wafer is between 4-12 inches (10- 30 cm) and a thickness of at most 1 mm Ω Wafers are obtained by cutting a single-crystal ingot into thin slices Ω The surface of a wafer is doped more heavily and a single crystal epitaxial layer of the opposite type is grown on the surface
VLSI CIRCUITS UDOM 14
Silicon Wafer Preparations… Wafer Etching and Polishing Ω Mechanical shaping of wafers leads to surface damage and contamination Ω Damage and contamination can be removed by chemically etching the wafers Ω Chemical etching of wafer in two types: ✓ Acid etching and ✓ alkali etching Ω Acid etching: wafers introduced into an acid sink
VLSI CIRCUITS UDOM 15
Silicon Wafer Preparations…
VLSI CIRCUITS UDOM 16
Silicon Wafer Preparations… Ω The wafer is cut (diced) into many pieces, each containing one copy of the circuit. Ω Each of these pieces is called a die. Ω A die is a small block of semiconducting material, on which a given functional circuit is fabricated.
VLSI CIRCUITS UDOM 17
Silicon Wafer Preparations… Ω Si wafer showing dies
VLSI CIRCUITS UDOM 18
Silicon Wafer Preparations… Ω Magnified scribe lines and Dies
VLSI CIRCUITS UDOM 19
Silicon Wafer Preparations… Ω Dies are used in the assembly of ICs
Triangulation - Applied to Sheet Metal Pattern Cutting - A Comprehensive Treatise for Cutters, Draftsmen, Foremen and Students: Progressing from the Simplest Phases of the Subject to the Most Complex Problems Employed in the Development of Sheet Metal Patterns with Practical Solutions of Numerous Problems of Frequent Occurrence in Sheet Metal Shops