CONTINUOUS EMISSION

MONITORING SYSTEM
http://www.fpi-inc.com/en
 CONTENTS
CONTENTS

02/03
02/03Methods
MethodsofofMeasurement
Measurement
In-situ
In-situ
gasgas
analysis
analysis
Extractive
Extractive
gasgas
analysis
analysis
Dilution
Dilution
gasgas
analysis
analysis

04/05
04/05Probe
ProbePrinciple
Principle
Heated
Heated
sampling
sampling
probe
probe
Dilution
Dilution
sampling
sampling
probe
probe
Dilution
Dilution
sampling
sampling
probe
probe
with
with
inertial
inertial
filtration
filtration
Isokinetic
Isokinetic
sampling
sampling
probe
probe

06/08
06/08Instrument
InstrumentPrinciple
Principle 09/09
09/09System
SystemLayout
Layout
TDLAS
TDLAS Product
Product
Matrix
Matrix
UV UV
DOAS
DOAS
Cold
Cold
Vapour
Vapour
Atomic
Atomic
Fluorescence
Fluorescence
Spectroscopy
Spectroscopy 10/14
10/14Product
ProductMatrix
Matrix
FTIR
FTIR CEMS-2000BS/BF
CEMS-2000BS/BF
UV UV
Fluorescence
Fluorescence CEMS-2000
CEMS-2000
D D
Chemiluminescence
Chemiluminescence CEMS-2000
CEMS-2000
Hg Hg
GasGas
Chromatography
Chromatography CEMS-2000
CEMS-2000
VOC
VOC
Laser
Laser
Back
Back
Scattered
Scattered CEMS-2000
CEMS-2000
B FT
B FT
CEMS-2000
CEMS-2000
B XRF
B XRF
LGA-4000
LGA-4000
PM-200
PM-200
LSS2004
LSS2004
TPF-100
TPF-100

15/18
15/18Application
Application
Iron
Iron
& Steel
& Steel
Power
Power
Plant
Plant
Waste
Waste
Incineration
Incineration
Cement
Cement

01 01
METHODS
METHODSOF
OFMEASUREMENT
MEASUREMENT

Probe
Probe
In-situ
In-situ
(dust
(dust
& TPF
& TPF In-situ
In-situ
(HCL,
(HCL,
HF, HF,
NH 3)NH 3)
without
without
gas gas
cylinder)
cylinder)

Extractive
Extractive
(CO,(CO, , SO
CO 2CO 2 ,2 ,SO 2 ,
NO, NO, , O 22), O 2)
NO 2NO

Methods
Methods
of Sampling
of Sampling
& Non-sampling
& Non-sampling
Measurement
Measurement

In-situ
In-situ
gasgas
analysis
analysis

TheThe
monitoring
monitoring
system
system
using
using
in-situ
in-situ
measurement
measurement to go
to go
extraction.
extraction.
TheThe
in-situ
in-situ
measurement
measurement
is also
is also
technology
technology
cancan
be be
mounted
mounted
at the
at the
stack
stack
directly
directly wellwell
proven
proven
in harsh
in harsh
conditions
conditions
in combination
in combination
of of
through
through
which
which
thethe
gasgas
flows.
flows.
ThisThis
system
system
ensures
ensures high
high
temperature,
temperature,
pressure,
pressure,
dust,
dust,
corrosives
corrosives
andand
minimum
minimum
maintenance
maintenance
andand
short
short
response
response
time
time contaminants.
contaminants.
to apply
to apply
stack
stack
emission,
emission,
especially
especially
for for
hydrosolu-
hydrosolu-
bleble
gases
gases
likelike
HCL,
HCL,
HF HF
andand 3 that
NHNH 3 that
areare
difficult
difficult

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02 02
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 Full extractive gas analysis
The extractive gas analysis can be used in probe, conditioned and transmitted to the
various applications. The sample gas is analyzer module under constant conditions.
extracted from the stack through selected

Hot-wet extractive method Cool-dry extractive method

The flue gas is carried along a heated This method can cool the sample under
sample line into the measuring cell at a controlled conditions to condense the water
constant temperature above the dew point. out and dry the sample. Heated sample line
In this case, the adverse impact of water is required to keep the wet sample above its
vapor on measurement accuracy is reduced dew point until it reaches the water removal
greatly. Some gases are partially soluble in system. Once the sample has been cooled
water (SO 2, NOx) and others fully soluble in and dried, it is then sent to an analyzer.
water (NH 3, HCL, HF). Due to the analysis is Moisture interference in analyzer is mini-
fully under continuous hot measurement mized since the water is removed complete-
conditions, no gases are lost and other ly.
issues such as corrosion can be prevented as
well.

Dilution extractive gas analysis

The dilution extractive technology is used sample is drawn into the probe at low flow
in a sampling probe with a critical orifice rates. This means that there will be less
designed to extract a sample of flue gas moisture to remove and less particulate
from stacks. The sample is mixed with matters to filter. Because the flow is relative
dilution air in the probe. Dilution ratio low, particles are more likely to follow the
controlled by using a critical orifice in the flue gas rather than to enter the probe.
box - critical flow maintained by achieving
a set pressure drop across orifice. The

03
PROBE PRINCIPLE

Heated sampling probe (Used in CEMS-2000BS/BF, CEMS-2000VOC, CEMS-2000B FT)

The probe realizes the primary filtration Internal and external dual purge ensures the
by using sintered-metal filter during sample flow will be effective in keeping dust
sample transportation. The sintered metal out of the probe.
is made by compressing micrometer-size
metal granules under high-pressure and
elevated temperature. It is capable to Heated enclosure Pneumatic valve Probe box
filtering particles below 2um in size. Filter

Extended and bent 316LSS tube is built in

to buffer sample gas and ensures its Sampling
tube
Flange
welded

thorough heating. According to this entire In-situ

Heating plates

heat tracing, no condensate water exists in

the sampling process, which prevents
choking and benefits less maintenance.

Dilution sampling probe (Used in CEMS-2000D)

The FPI dilution sampling probe provides than the lowest ambient temperature. This
accurate dilution of the sample gas enables the CEMS to avoid the use of
stream. With optional dilution ratio up to heated tracing line and simplifies the gas
200:1, it can be used in ultra-low emis- transportation system.
sion scenario. The probe keeps the critical
orifice and jet pump outside the stack in
a temperature controlled environment Diluted
sample gas
along with a heated filter. Sample gas
passes consecutively through particulate Filter

filter, critical orifice, and finally diluted Sonic orifice

with vapor-free zero air from FPI zero air Check valve

generator. It dilutes the sample gas to Standard gas/ Dilution gas

Purge gas
such a degree that the dew point is less
ø8

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04
 PROBE
PROBEPRINCIPLE
PRINCIPLE

Dilution
Dilution
sampling
sampling
probe
probe
with
with
inertial
inertial
filtration
filtration
(Used
(Used
in CEMS-2000B
in CEMS-2000B
Hg)Hg)
Designed
Designed forfor
mercury
mercury measurement,
measurement, it it capability
capability of mercury,
of mercury,
all all
parts
parts
exposed
exposed
to to
cancancater
cater
to to
a wide
a widerange
range of applications,
of applications, thethe samplesample
coated
coated
withwith
inert
inert
material
material
andand
suchsuchas as
in coal-based
in coal-based power
power plant,
plant,
incin-
incin- heated
heated up up
to to
180˚C.
180˚C.
eration
erationplant,
plant,
andand
cement
cement plant.
plant.
WithWith
highhighdust
dust
concentration
concentration in these
in theseapplica-
applica-
tions,
tions,
thisthis
probe
probe
usesuses
inertial
inertial
filtration
filtration Heating
Heating
sampling
sampling
probe probe Differential
Differential
pressurepressure

technique
technique andandprimary
primary sintered-metal
sintered-metal Jet pump Porous osmosis
Jet pump Porous osmosis
tube tube transmitter
transmitter

Venturi tube
Venturi tube

filter
filter
to to
prove
provea dust-free
a dust-free analysis.
analysis.HgHg SolenoidSolenoid
valve valve
Filter Filter
converter
converter which
whichoperated
operated at 800˚C
at 800˚C is is Check valve
Check valve PressurePressure
transmitter
transmitter
1# 1#
SolenoidSolenoid
valve valve

usedusedto to
dissociate
dissociate various
various type
typeof mercu-
of mercu- SolenoidSolenoid
valve valve Orifice Orifice

ry to
ry to
elemental
elemental mercury.
mercury. This,
This,
along
alongwith
with PressurePressure
transmitter
transmitter
2# 2# Air
tank
Air
tank

thetheelemental
elemental mercury
mercury already
alreadypassing
passing
Heater Heater
Jet pump
Jet pump

through,
through, gives
gives
thethe
total
total
mercury
mercury of the
of the Hg valence
Hg valence
converter
converter

sample.
sample. Due Due
to to
thethe
strong
strong adsorption
adsorption

Isokinetic
Isokinetic
sampling
sampling
probe
probe
(Used
(Used
in PM-200,
in PM-200,
CEMS-2000B
CEMS-2000B
XRF)
XRF)
It isIt designed
is designed to tomonitor
monitor ultra-low
ultra-lowparti-
parti- probe
probe
cancan
be be
used
used
in conjunction
in conjunction
with
with
ourour
clesclesin the
in theflueflue
gasgaswithout
without disturbing
disturbing PMPM
analyzer
analyzer
or or
heavy
heavy
metal
metal
analyzer.
analyzer.
their
their paths.
paths. TheThe velocity
velocityof the
of the
sample
sample
gasgas goinggoingintointothethe
sampling
sampling probe
probenozzle
nozzle
DilutionDilution
gas gas
is equal
is equal to to
thethevelocity
velocityof the
of the
undisturbed
undisturbed heater heater

sample
sample gasgasat that
at that
point.
point.With
With
thethe
inertial
inertial Sampling
Sampling
probe probe

separation,
separation, thisthis
probe
probeis proven
is provento to
work
work Pneumatic
Pneumatic
ball valve
ball valve DilutionDilution

after
after scrubber
scrubber or or
in high
in high
humidity
humidity appli-
appli- Pitot tube
Pitot tube
Back flushing
Back flushing
Pneumatic
Pneumatic
valve Avalve A
cation.
cation. Meanwhile,
Meanwhile, all all
thethe
sampling
sampling parts
parts Pneumatic
Pneumatic
valve B valve B
Static pressure
Static pressure
exposed
exposed to to
thethe sample
sample gasgasareare
heated
heatedup up Dynamic
Dynamic
pressure
pressure

to to60˚C 60˚C
to to
prevent
prevent water
water
condensation
condensation
andand particle
particleadsorption.
adsorption. TheThesample
sample

05 05
INSTRUMENT
INSTRUMENTPRINCIPLE
PRINCIPLE

TDL
TDLASAS
Tunable
Tunable DiodeDiodeLaser
Laser Absorption
AbsorptionSpectroscopy
Spectroscopy
(TDLAS)
(TDLAS) is aistechnique
a technique forfor
measuring
measuringthethe Conventional
Conventional
Light Light
sourcesource
spectral
spectral
widthwidth

concentration
concentration of certain
of certain species
species
including
including
NHNH3 , HCL,
3 , HCL,
HF HF
or H
or2 SHetc.
2 S etc.
Use Use
of diode
of diode
laser
laser LaserLaser
spectral
spectral
widthwidth

wavelength
wavelength tuning
tuning characteristics,
characteristics,
thethe
laser
laser
beam
beam is absorbed
is absorbed by bythethemeasured
measuredgas,
gas,
so so
as as LaserLaser
frequency
frequency
modulation
modulation
rangerange

to acquire
to acquire thetheconcentration
concentration of the
of the
compo-
compo-
nents.
nents. TheThe laser
laser
spectrum
spectrum features
features
excellent
excellent
monochromaticity
monochromaticity that that
cancanprevent
prevent
thethe
measuring
measuring gasgasfromfrombeingbeingaffected
affected
by by
over-
over- II III I
lapping
lapping spectrum
spectrum of all
of all
background
background gases.
gases. Frequency
Frequency
Other Other
gas speciest
gas speciest Gas under
Gas under
test test

“Single-line
“Single-line
spectrum”
spectrum”
mearsurement
mearsurement

UVDOAS
UV DOAS
Differential
Differential Optical
OpticalAbsorption
Absorption Spectroscopy
Spectroscopy grating,
grating,
andand
converted
convertedinto
into
electric
electric
signal
signal
by by
(DOAS)
(DOAS) is aiskind
a kind
of spectrum
of spectrum monitor
monitor tech-
tech- thethe
array
array
sensor,
sensor,
a continuous
a continuous absorption
absorption
nique.
nique.ThisThistechnique
technique is based
is based on onBeer-Lam-
Beer-Lam- spectrum
spectrum
of measuring
of measuringgasgas
is thereafter
is thereafter
bert’s
bert’s absorption
absorption law.law.
It states
It statesthetherelation-
relation- obtained.
obtained.
ship
shipbetween
between thethe
quantity
quantity of light
of lightabsorbed
absorbed
Sample
Sample
in in Sample
Sample
out out
andandthethenumber
number of molecules
of molecules in the
in the
light
light
path.path.
Ultraviolet
Ultraviolet light
light
withwith
a wide
a wide rangerangewavelength
wavelength
is generated
is generated by by
a xenon
a xenon light.
light.
TheThebeambeam
converged
converged to an
to an
optical
optical
fiberfiber
andand thenthen
passes
passes
through
through a measuring
a measuring cellcell
whichwhichfilled
filled
withwith
Gas Gas
chamber
chamber
sample
sample gas.gas.
Depending
Depending on onthethe concentration
concentration
of the
of thetarget
targetgasgas
in the
in the
cell,cell,
some someportion
portion of of lightlight
source
source
thethe
ultraviolet
ultraviolet energy
energywillwill
be be absorbed.
absorbed. If the
If the
target
targetcompound
compound hashasstrong
strongabsorbance
absorbance peaks
peaks
at more
at more thanthanoneone
wavelength,
wavelength, thethepeakpeak
that that
is is Digital
Digital
signal
signal
processing
processing
most
most unique
unique to that
to that
compound
compound willwill
usually
usuallybe be
selected.
selected. AfterAfter
absorption
absorption by bymeasuring
measuring gas, gas, Spectrograph
Spectrograph
thethe
light
light
beam beamtransfers
transfersthrough
through optical
optical
fiberfiber
to spectrometer.
to spectrometer. Being
Beingdispersed
dispersed through
through thethe

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06 06
 INSTRUMENT PRINCIPLE

Cold Vapour Atomic Fluorescence Spectrometr y

A Cold Vapour Atomic Fluorescence Spectrom- light intensity of the emitted light, it is possi-
etry (CVAFS) mercury analyzer emits an ble to measure the concentration of the mer-
element-specific spectrum, which enables an cury concentration.
extremely sensitive level of mercury measure- Sample in
Mecury lamp
ment. A sample gas absorbs light at a particu- Filter
lar wavelength to promote the Hg atoms from
its ground electronic state into the excited
state. The excited Hg atoms from that excited
state decay back to the ground energy state
and emit UV light that is proportional to the Lens Lens
Hg concentration in this process. Thereafter,
the Hg fluorescence is monitored by a photo- Sample out
PMT
multiplier tube (PMT) placed at a right angle
to the exciting radiation. By measuring the

F TIR
Fourier Transform Infrared (FTIR) is a technique
Gas in Gas out
used to obtain an infrared spectrum of gas
absorption. Radiation emitted from light
source is split into two with a beamsplitter in
the interferometer. The fixed and moving
mirrors reflect each of beam back to the
beamsplitter, where the two beams recombine
into one and return to the detector. When the
moving mirror is moved, the recombined
beams will vary constructively or destructively
as the optical path difference. The sample gas
can be determined as an interferogram and
contains all infrared information when the Interferometer

combine beams are transmitted through the Static IR light source

sample. mirror

Moving mirror IR detector

07
UV Fluorescence
Ultraviolet fluorescence method is based the
principle of the characteristic fluorescence
released by the sulfur dioxide molecule when

Light soource
detector
Reference
it is radiated by UV light of 190-230 nm. SO 2 214nm SO 2 214nm

absorbs light in this region of the spectrum

330nm
without any quenching by air or other mole-
cules found in the polluted air. The intensity
of fluorescence is proportional to the SO 2
concentration. PMT

Chemiluminiscence
Chemiluminiscence is the generation of elec- O3 NO

tromagnetic radiation as a light emitted by

the release of energy from a chemical reac-
tion. The chemiluminescent substance is
excited by the intermediates from oxidation
and catalysis. When the excited intermediates
return back to their stable ground state, light
is released, which is detected by an instru- Luminescence
ment to determine the amount of sample FILTER

gases. PMT

Gas Chromatography
GGas chromatography (GC) is a type of Flame Ionization Detector (FID). This process
chromatography used in analytical chemistry enables detection with high sensitivity and
for separating and analyzing mixture which precision.
can be vaporized without decomposition. In Sample in
Detector
GC, the mobile phase (mixture dissolved in a
Recorder
fluid) is a carrier gas, usually an inert gas or
unreactive gas. The stationary phase is the Column

column for separating components, causing

each one to exit the column at different time
and to be detected later by specified detec- Carrier gas
Constant temperature chamber
tor such as Photoionization Detector (PID),

Laser Back Scattered

The 650nm laser beam sent by the laser at a
tiny angle into the emission source, where Glass

Flue
the light is reflected by the dust particles to Lense

generate scattered light. The back scattered

Opt-Sense
K3

light will be processed in the sensor into Pr=Po*K1 2 *D*K3

electrical signals which is proportional to K2

Po: Detective laser diode output power

dust concentration. K1 D : Dust concentration in stack

K1: Dust shutter attenuation,influenced by dust
deposition
K2: Dust reflection coefficient,related to the particle
structure of dust
K3: Lens convergence gain,regarded as constant

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08
 SYSTEM
SYSTEMLAYOUT
LAYOUT

FPIFPI
Continuous
Continuous Emission
Emission Monitoring
Monitoring System
System(CEMS)
(CEMS) provides
providesapplication-based
application-based complete
complete
gasgas
analysis
analysissystems,
systems, integrated
integratedwithwith
Particulate
Particulate
Monitoring
MonitoringSubsystem,
Subsystem,Gaseous
GaseousMonitoring
Monitoring
Subsystem,
Subsystem, TPFTPFMonitoring
Monitoring Subsystem
Subsystem andand
DataData
Acquisition
Acquisition
Subsystem
Subsystem(DAS)
(DAS)optionally
optionally
in in
oneone
19"19"
rack
rackcabinet,
cabinet,covering
coveringall all
thethe
indicators
indicators
andandparameters
parametersto to
satisfy
satisfy
different
different
customer
customer
needs.
needs.
TheThe
DAS DASis the
is the
software
softwarewhich
which
plays
plays
a vital
a vital
role
role
in data
in data
collection,
collection,
continuous
continuousrecord-
record-
inging
andand
data
datatransmission.
transmission. TheThe
system
systemprovides
providesimportant
importantinformation
information
forfor
environment
environment
agency
agencyandand
industry
industry facilities
facilities
to to
evaluate
evaluate
andand
analyze
analyze
thethe
emission
emission
rate
rate
andandeconomical
economical
operation.
operation.

Particulate
Particulate
Monitoring
Monitoring
Subsystem
Subsystem DataData
Acquisition
Acquisition
Subsystem
Subsystem

LSS2004
LSS2004

Gaseous
Gaseous
Monitoring
Monitoring
Subsystem
Subsystem

Sampling
Sampling
System
System DataData
Output
Output

GasGas
Chamber
Chamber
DataData
PrintPrint

ZeroZero
Gas,Span
Gas,Span
GasGas

DataData
LogLog

TPFTPF
Monitoring
Monitoring
Subsystem
Subsystem

Temperature
Temperature
Detector
Detector

Pressure
Pressure
Detector
Detector

FlowFlow
RateRate
Detector
Detector

CEMS
CEMS
Subsystem
Subsystem

09 09
Product
ProductMatrix
Matrix
Type
Type CEMS-2000BS/BF
CEMS-2000BS/BF CEMS-2000
CEMS-2000
D D

Figures
Figures

Dilution Extractive
Dilution (20:1~200:1),
Extractive (20:1~200:1),
Principles
Principles UV-DOAS
UV-DOAS
& NDIR
& NDIR
UV UV
fluorescence, Chemiluminescence
fluorescence, Chemiluminescence

Components
Components SO 2SO
, NOx,
2 , NOx,
O 2, O
CO,
2 , CO,
CO 2CO 2 SO 2SO
, NOx,
2 , NOx,
H 2O,
H 2O
O,2 O 2

Temperature
Temperature (-20~50)℃
(-20~50)℃ (-20～50)℃
(-20～50)℃

SO 2SO
: 0~75~14000
2 : 0~75~14000
mg/m
mg/m
3 3

NO/NOx:
NO/NOx:
0~100~7000
0~100~7000
mg/m
mg/m
3 3

Range
Range O 2: O
0~25%
2 : 0~25% 0~50~10000mg/m
0~50~10000mg/m
3 3

CO:CO:
0~1300
0~1300
mg/m
mg/m
3 3

CO 2CO
: 0~20%
2 : 0~20%

Detection
Detection
Limit
Limit 1ppm
1ppm ≤0.1mg/m
≤0.1mg/m
3 3

Linearity
Linearity ≤±1%F.S.
≤±1%F.S. ＜±1%F.S.
＜±1%F.S.

Span
Span
Drift
Drift ≤±2%F.S./24h
≤±2%F.S./24h ≤±2%F.S./24h
≤±2%F.S./24h

Zero
Zero
Drift
Drift ≤±2%F.S./24h
≤±2%F.S./24h ≤±2%F.S./24h
≤±2%F.S./24h

Repeatability
Repeatability ≤±1%
≤±1% ＜±1%
＜±1%

Response
Response
Time
Time ≤90s
≤90s 80s~180s
80s~180s
(T90)
(T90)

Power
Power
Supply
Supply 220(1±10%)
220(1±10%) V AC/(50-60)
V AC/(50-60) Hz Hz 220(1±10%) V AC/(50-60)
220(1±10%) Hz Hz
V AC/(50-60)

4~20mA, RS232,
4~20mA, RS485,
RS232, GPRS(optional),
RS485, GPRS(optional),
Output
Output 4~20mA,
4~20mA, RS232,
RS232, RS485
RS485 Ethernet(optional), Support
Ethernet(optional), Supportdynamic
dynamic
management
managementandand
control
control

Benefits
Benefits
& Features
& FeaturesPneumatic
Pneumaticconstant
constant
temperature
temperaturefromfrom LowLow detection
detection limit
limit
sampling
sampling
to probe
to probe
avoids
avoids
water
water
interference
interference
andand
reduces
reduces
sample
sample
lossloss Customized
Customized dilution
dilution raterate

No No
moving
moving
part
part
for for
maintenance
maintenance
freefree Contaminants
Contaminants of flue
of flue gasgas in the
in the ambient
ambient
level
level for for minimal
minimal corrosion
corrosion to analyzer
to analyzer
Bright
Bright
digital
digital
readout
readoutfor for
monitoring
monitoring
gasgas
LowLow maintenance
maintenance duedue to high
to high stability
stability
Complies
Complies
withwith
U.S.U.S.
EPAEPA
regulations
regulations of the
of the system
system

Operation
Operation in ambient
in ambient condition
condition & easy
& easy
replaced
replaced by by modular
modular design
design

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10 10
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 Product Matrix
Type CEMS-2000 Hg CEMS-2000 VOC

Figures

Principles Dilution extractive (40:1), Cold FID & PID

Vapor Atomic Fluorescence (CVAFS)

Components Hg 0, Hg 2+, Hg T CH4/NMHC, BTX, Ordour（CS 2）

Temperature (-20~50)℃ (-20~50)℃

CH 4/NMHC: 0~20/50/100/200/5000 mg/m 3

Range 0.1~500 μg/m 3
BTX: 0~20/50/1000 mg/m 3

CH 4/NMHC: 0.05 mg/m 3

Detection Limit 0.05µg/m 3
BTX: 0.35 mg/m 3

Linearity ≤±1%F.S. —

Span Drift ≤±2%F.S./24h ≤±1%F.S./24h

Zero Drift ≤±2%F.S./24h ≤±1%F.S./24h

Repeatability ≤±2% ≤±2%

Response Time 180~360s ≤60s

220VAC/50Hz 1.5KW (without 220VAC/50Hz 2KW (without sampling line,

Power Supply
sampling line, compressor) compressor)

10 channels-Analog, RS485, RS232,

Output Analog, Ethernet connection, RS485, GPRS
GPRS

Benefits & Features Pneumatic constant temperature Low detection limit

from sampling to probe avoids
water interference and reduces Customized dilution rate
sample loss
Contaminants of flue gas in the ambient
No moving part for maintenance
level for minimal corrosion to analyzer
free

Bright digital readout for monitoring Low maintenance due to high stability
gas of the system

Complies with U.S. EPA regulations Operation in ambient condition & easy
replaced by modular design

11
Type CEMS-2000 B FT CEMS-2000 B XRF

Figures

Principles FTIR Spectroscopy X-ray fluorescence

Pb, Cd, Hg, As, Cr, Cu, Zn, Ni, Ba, Fe, Ag,
SO 2, NOx, O 2, CO, CO 2, HCL, HF, NH 3,
Components Se, Br, Te, Sb, Sn, Ti, Co, Mn, Pd, TI, Sc,
H 2O, T, flow, pressure, humidity
Mo, V, Ca, K, Ga, Cs

Temperature (-20～50)℃ (5～40)℃

(mg/m 3) SO 2:0~75~2000,
NO:0~100~2000, NO 2:(0~50~1000),
NOx:0~100~2000, NH 3:0~10~50,
Range (0~2000) µg/m 3
HCL:0~15~1500, HF:0~10~50,
CO:0~75~1000, CO 2:0~20%,
H 2O:0~40%, O 2:0~25%

(mg/m 3) SO 2:0.45, NO:0.8, NO 2:0.4,

Detection Limit NH 3:0.1, HCL:0.35 HF:0.25, CO:0.2, ＜0.1 µg/m 3
CO 2:0~20%, H 2O:0~40%, O 2:0~25%

Linearity ≤±2%F.S. ≤±1%F.S.

Span Drift ≤±2%F.S./24h ≤±1%F.S./24h

Zero Drift ≤±2%F.S./24h ≤±10%F.S./24h

Repeatability ≤±2% —

SO 2, NOx, CO, CO 2≤180s (50m);

Response Time Sampling & analysis cycle: 10~120mins
HCL, HF, NH 3≤300s

220VAC/50Hz 2KW (without sampling

Power Supply line, compressor) 220 (1±10%) VAC, (50±1) Hz, ≤5kW
Heating trace pipe: 130W/m

Analog, Ethernet connection, RS485,

Output RS232, RS485, Ethernet
GPRS, System on-off, DP (optional)

Benefits & Features Pneumatic constant temperature from Simultaneously analyzing 28 most regular
sampling to probe avoids water heavy metal elements, others scalable
interference and reduces sample loss
Truly continuous and non-destructive
No moving part for maintenance free measurement, no pretreatment needed

Bright digital readout for monitoring No chemical, no liquid waste, reliable and
gas less maintenance

Complies with U.S. EPA regulations 13 patents borne by the single analyzer

Radiation safety certified

www.fpi-inc.com/en
12
 Product
ProductMatrix
Matrix
Type
Type LGA-4000
LGA-4000 PM-200
PM-200

Figures
Figures

Principles
Principles TDLAS
TDLAS Extractive
Extractive
β ray
β ray
attenuation
attenuation

O 2, O
CO,
2 , CO,
CO 2CO
, H22,S,H 2HCL,
S, HCL,HF,HF, NHNH3 , H32,O,
H 2O,
Components
Components Particulate
Particulate
HCN, HCN, CH 4CH
, C42,HC2,2H
C22,HC4,2H
CH4, 3
CHI 3I

Temperature
Temperature (-30～60)℃
(-30～60)℃ (-30～55)℃
(-30～55)℃

(ppm) CO/CO
(ppm) 2 :0~1000,
CO/CO 2 :0~1000,
H 2O:0~50,
H 2O:0~50,
H 2S:0~2000,
H 2S:0~2000,
HF:0~5,
HF:0~5,
HCL:0~50,
HCL:0~50,
Range
Range 0~5/10/20/50/200mg/m
0~5/10/20/50/200mg/m
3 3
HCN:0~30,
HCN:0~30, 3 : 0~10,
NHNH 3 : 0~10,
CH 4CH
:0~40,
4 :0~40,

C 2HC2:0~10,
2 H 2 :0~10,
C 2HC4/CH
2 H 4 /CH
3 I:0~60,
3 I:0~60,
O 2:0~1%
O 2:0~1%

CO/CO
CO/CO 2 :10,
2 :10,
H 2O:0.3,
H 2O:0.3,
H 2S:20,
H 2S:20,
HF:0.02,
HF:0.02,
Detection
Detection
Limit
Limit
HCL:0.1,
HCL:0.1,
HCN:0.3,
HCN:0.3, 3 :0.1,
NHNH 3 :0.1,
CH 4CH
:0.4,
4 :0.4, 0.1mg/m
0.1mg/m
3 3

C 2HC2:0.1,
2 H 2 :0.1,
C 2HC4/CH
2 H 4 /CH
3 I:0.6,
3 I:0.6,
O 2:100
O 2:100

Linearity
Linearity ≤±1%F.S.
≤±1%F.S. ≤±2%F.S.
≤±2%F.S.

Span
Span
Drift
Drift ≤±1%F.S./6 months
≤±1%F.S./6 months ≤±1.5%F.S./24h
≤±1.5%F.S./24h

Zero
Zero
Drift
Drift ≤±1%F.S./6 months
≤±1%F.S./6 months ≤±1.5%F.S./24h
≤±1.5%F.S./24h

Repeatability
Repeatability ≤±1%
≤±1% ≤±2%
≤±2%

Response
Response
Time
Time ≤1s≤1s 7mins
7mins

Power
Power
Supply
Supply 24V24V
DC DC
(21-36V DC),
(21-36V or 90-240V
DC), AC AC
or 90-240V 220V50Hz, Maximum
220V50Hz, 4kVA
Maximum 4kVA

Analog 2 outputs
Analog 4-20mA;
2 outputs 4-20mA; Ethernet, RS485,
Ethernet, Analog
RS485, 4 channels
Analog 4 channels
Output
Output
relay 3 outputs
relay 24V24V
3 outputs DC/1A
DC/1A 4-20mA,
4-20mA,Relay outputs
Relay 6 channels
outputs 6 channels

Benefits
Benefits
& Features
& FeaturesDirect,
Direct,
fastfast
in-situ
in-situ
measurement
measurement Sampling
Sampling
probe
probe
complies
complies
with
with
U.S.U.S.
EPAEPA
regulations
regulations
No No
cross
cross
interference
interference
β ray
β ray
avoids
avoids
measurement
measurement from
from
particle
particle
Diverse
Diverse
optical
optical
length
length
(0.5~20m)
(0.5~20m) shape
shape
andand
color
color
interference
interference

Reliable
Reliable
in all
in all
harsh
harsh
conditions:
conditions:
highhigh Time
Time
of tape
of tape
change
change
over
over
3 months
3 months
temperature
temperature& pressure,
& pressure,
dust
dust
density,
density,
moisture
moisture
andandcorrosion
corrosion

13 13
Type
Type LSS2004
LSS2004 TPF-100
TPF-100

Figures
Figures

Platinum
Platinum electric
electric resistance
resistance
Principles
Principles Laser
Laser
back
back
scattered
scattered Silicon
Silicon on on insulator
insulator pressure
pressure sensor
sensor
Pitot
Pitot tube
tube differential
differential pressure
pressure

Components
Components Dust
Dust Temperature
Temperature
& Pressure
& Pressure
& Folw
& Folw
raterate

Temperature
Temperature (-20～50)℃
(-20～50)℃ (-40～50)℃
(-40～50)℃

(0～400)
(0～400) ℃ ℃
Range
Range 0~200~1000mg/m
0~200~1000mg/m 3 3 (-5～5)Kpa
(-5～5)Kpa
(5～40)m/s
(5～40)m/s

Detection
Detection
Limit
Limit (±1)%F.S.
(±1)%F.S. — —

(±0.5)%F.S.
(±0.5)%F.S.
Linearity
Linearity (±2)%F.S./24h
(±2)%F.S./24h (±0.5)%F.S.
(±0.5)%F.S.
≤±5%F.S.
≤±5%F.S.

Span
Span
Drift
Drift (±2)%F.S./24h
(±2)%F.S./24h — —

Zero
Zero
Drift
Drift (±2)%F.S./24h
(±2)%F.S./24h ≤±0.1%F.S.
≤±0.1%F.S.

Repeatability
Repeatability — — ≤±0.49%F.S.
≤±0.49%F.S.

Response
Response
Time
Time ≤10s
≤10s ≤10s
≤10s

Transmitter: 24V24V
Transmitter: DC DC
Power
Power
Supply
Supply DC24V/0.3A
DC24V/0.3A
Magnetic valve:
Magnetic 220V
valve: AC AC
220V

Output
Output Analog,
Analog, RS485
RS485 (4～20)mA
(4～20)mA

Benefits
Benefits
& Features
& FeaturesOn-line
On-line continuous
continuous monitoring
monitoring for for FullFull capabilities
capabilities of data
of data acquisition,
acquisition,
various
various emission
emission sources
sources processing,
processing, storage
storage andand transfer
transfer

Combined
Combined techniques:
techniques: adaptive
adaptive Daily,
Daily, monthly,
monthly, yearly
yearly reports
reports
stabilization,
stabilization, dynamic
dynamic adaptive
adaptive automatically
automatically created
created
phase-lock
phase-lock amplification
amplification
Data
Data value
value & curve
& curve real-time
real-time display,
display,
Compact,
Compact, easy
easy to install,
to install, antilightning, history
antilightning,history data
data traceable
traceable
high
high adaptability,
adaptability, lowlow cost
cost andand
lessless
Remote
Remote monitoring,
monitoring, management
management andand
maintenance
maintenance
remote
remote parameter
parameter configuration
configuration

www.fpi-inc.com/en
14 14
www.fpi-inc.com/en
 APPLICATION

Iron & Steel

Every iron and steel plant operation requires energy in the form of heat or electricity. Combustion sources
that produce emissions in plant are sintering furnace, coke oven, blast furnace, hot blast stove, basic
oxygen furnace and electric arch furnace, etc. These facilities burn fuels such as coal, fuel oil, coke oven
gas, and blast furnace gas. SO 2 , NOx , CO , CO 2 and dust which generated during these processes are
required to be measured.

1 3 4

Storage
Sinter
plant
Iron ore Stack
2
Stack

Coke
Blast furnace
furnace
Coal Stack

Oxygen furnace

Scrap Iron products

Electric furnance

Mark Measuring Point Measuring Components Analyzer

CEMS-2000BS/BF,
1 Sintering plant stack CO, CO 2, SO 2, NOx, O 2
LGA-4000, LSS2004, TPF

CEMS-2000BS/BF,
2 Coke oven stack CO, CO 2, SO 2, NOx, NH 3,O 2
LGA-4000, LSS2004, TPF

CEMS-2000BF, LGA-4000,
3 Blast furnace stack CO, CO 2, SO 2, NOx, O 2
LSS2004, TPF

4 Basic oxygen furnace stack CO, CO 2, O 2, H 2O CEMS-2000BS, LGA-4000

15
Thermal Power Plant
Various requirements of flue gas monitoring are applied in power plant, for example, in the upstream
and downstream of desulfurization and de-nitration processes, the auxiliary CEMS can be equipped to
monitor the real-time pollutants concentration. The major target pollutants are SO 2 , NOx, CO and dust
as well as reference parameters such as flow rate, temperature, O 2 and humidity where is applicable.
Mercury measurement is also required in some countries by regulation.

1 2 3 4 5 6

Generator

Steam NH3

coal bin
DeNOx

Air

Coal mill
Stack
Flue gas
desulphurization
(FGD)
Dust filter

Cooling tower

Mark Measuring Point Measuring Components Analyzer

1 DeNOx upstream NO, NO 2, O 2 CEMS-2000BS

2 DeNOx downstream NO, NO 2, O 2, NH 3 CEMS-2000BS, LGA-4000

3 Dust filter monitoring Dust LSS2004

4 FGD upstream SO 2, Dust CEMS-2000BS, LSS2004

5 FGD downstream SO 2 CEMS-2000BS

CEMS-2000BS/BF,
SO 2, NO, NO 2, O 2, CO, CO 2,
6 Stack CEMS-2000Hg, LSS2004,
H 2O, Flow, Hg, Dust
TPF

www.fpi-inc.com/en
16
 APPLICATION
APPLICATION

Waste
WasteIncineration
Incineration
Generally,
Generally,
waste
waste
incineration
incineration
is the
is the
oxidation
oxidation
of the
of the
combustible
combustible
waste
waste
source
source
consisting
consisting
of organic
of organic
substances,
substances,
minerals,
minerals,
metals
metals
andand
water.
water.
During
During
incineration
incineration
process,
process,
flueflue
gases
gases
such
such
as HCL
as HCL
, HF, HF
, NH 3 , 3 ,
, NH
Dioxin
Dioxin
, VOCs
, VOCs
, SO , NOx
, 2SO 2 , NOx
, CO
, CO
, Hg
, Hg
areare
generated
generated
andand
emitted
emitted
intointo
thethe
ambient.
ambient.
These
These
substances
substances
areare
highly
highly
corrosive
corrosive
andand
hazardous
hazardous
which
which
should
should
be be
controlled
controlled
andand
continuously
continuously
monitored
monitored
according
according
to the
to the
local
local
environmental
environmental
regulation.
regulation.

1 1 2 2 3 3 4 4 5 56 6 7 7 8 8

FGD FGD
Generator
Generator

Steam
Steam
NH3NH3

LimeLime
water
water

StackStack
Dioxin
Dioxin
absorber
absorber

Combustion
Combustion DustDust
filterfilter Flue Flue
gas scrubber
gas scrubber DeNOx
DeNOx

Mark
Mark Measuring
Measuring
Point
Point Measuring
Measuring
Components
Components Analyzer
Analyzer

1 1 Dust
Dust
filter
filter
monitoring
monitoring Dust
Dust LSS2004
LSS2004

2 2 Flue
Flue
gasgas
scrubber
scrubber
upstream
upstream NO,NO, 2 , HCL
NONO 2 , HCL CEMS-2000BS,
CEMS-2000BS,
LGA-4000
LGA-4000

3 3 Flue
Flue
gasgas
scrubber
scrubber
downstream
downstream NO,NO, 2 , HCL
NONO 2 , HCL CEMS-2000BS,
CEMS-2000BS,
LGA-4000
LGA-4000

4 4 DeNOx
DeNOx
upstream
upstream NO,NO, 2 , O22, O 2
NONO CEMS-2000BS
CEMS-2000BS

5 5 DeNOx
DeNOx
downstream
downstream NO,NO,
NONO
2 , O22, , O
CO,
2 , CO,
NHNH
3 3 CEMS-2000BS,
CEMS-2000BS,
LGA-4000
LGA-4000

6 6 Dioxin
Dioxin
absorber
absorber
upstream
upstream CO CO LGA-4000
LGA-4000

7 7 Dioxin
Dioxin
absorber
absorber
downstream
downstream CO CO LGA-4000
LGA-4000

SO 2SO
, NO,
2 , NO,
NONO
2 , O22, , O
CO,
2 , CO,
NHNH
3, 3, CEMS-2000B
CEMS-2000B
FT, FT,
8 8 Stack
Stack
HCL,
HCL,
HF,HF,
VOCsVOCs CEMS-2000
CEMS-2000
VOC,
VOC,
LGA-4000
LGA-4000

17 17
Cement
Cement(Dry
(DryProcess)
Process)
During
During
thethe
production
production
of cement
of cement
or cement
or cement
clinker,
clinker,
cement
cement
plants
plants
emit
emit
a range
a range
of pollutants
of pollutants
from
from
thethe
carbonaceous
carbonaceous
fuels
fuels
burning
burning
in the
in the
rotary
rotary
kiln.
kiln.
TheThe
rawraw
material
material
andand
fuelfuel
willwill
produce
produce
andand
form
form
gaseous
gaseous
combustion
combustion
products,
products,
including
including , NOx
SO 2SO 2 , NOx
, CO
, CO
, CO
, 2CO
and
2 and
dust.
dust.
When
When
alternative
alternative
fuels
fuels
andand
waste-derived
waste-derived
fuels
fuels
areare
used,
used,
cement
cement
kilns
kilns
areare
required
required
to monitor
to monitor
Hg Hg
, HCL
, HCL
, HF, HF
andand
VOCs.
VOCs.

2 2 1 1

I.D Fan
I.D Fan

Raw Raw
mealmeal
StackStack

Bag filter
Bag filter

Coal Coal
mill mill
Cooling
Cooling
tower
tower

Secondary
Secondary
firing(tyres,
firing(tyres,
waste...)
waste...) StackStack

Coal Coal Cooler

Cooler
Rotary
Rotary
kiln kiln
Dedusting
Dedusting
Clinker
Clinker

Mark
Mark Measuring
Measuring
Point
Point Measuring
Measuring
Components
Components Analyzer
Analyzer

1 1 Stack
Stack SO 2SO
, NO,
2 , NO,
NONO
2 , O22, , O
CO,
2 , CO,
CO 2CO 2 CEMS-2000BF
CEMS-2000BF

2 2 Stack
Stack O 2, O
CO2 , CO LGA-4000
LGA-4000

www.fpi-inc.com/en
www.fpi-inc.com/en
18 18
Focused Photonics (HangZhou) Inc.
760 Bin'an Road, Binjiang District
Hangzhou 310052
H W 20180212V 1P1

China
Tel: +86 571 8501 2188
Fax: +86 571 8501 2188
http://www.fpi-inc.com/en/