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Diffraction of A Circular Aperture

The document discusses Fraunhofer diffraction, which describes how light spreads when illuminated through an aperture and observed far away. It explains Huygens' principle and how interference between secondary wavelets causes diffraction patterns. Formulas are provided that describe the diffraction patterns from circular apertures, including the characteristic Airy pattern consisting of a central maximum surrounded by alternating bright and dark rings.

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0% found this document useful (0 votes)
55 views5 pages

Diffraction of A Circular Aperture

The document discusses Fraunhofer diffraction, which describes how light spreads when illuminated through an aperture and observed far away. It explains Huygens' principle and how interference between secondary wavelets causes diffraction patterns. Formulas are provided that describe the diffraction patterns from circular apertures, including the characteristic Airy pattern consisting of a central maximum surrounded by alternating bright and dark rings.

Uploaded by

Nofer Hulu
Copyright
© © All Rights Reserved
We take content rights seriously. If you suspect this is your content, claim it here.
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DiffractionofaCircularAperture

Diffraction can be understood by considering the wave nature of light. Huygen's principle, illustrated in
the image below, states that each point on a propagating wavefront is an emitter of secondary
wavelets. The combined locus of these expanding wavelets forms the propagating wave. Interference
between the secondary wavelets gives rise to a fringe pattern that rapidly decreases in intensity with
increasing angle from the initial direction of propagation. Huygen's principle nicely describes
diffraction, but rigorous explanation demands a detailed study of wave theory.

Huygen's principle

Diffraction effects are traditionally classified into either Fresnel or Fraunhofer types. Fresnel diffraction
is primarily concerned with what happens to light in the immediate neighborhood of a diffracting object
or aperture. It is thus only of concern when the illumination source is close to this aperture or object.
Consequently, Fresnel diffraction is rarely important in most optical setups.

Fraunhofer diffraction, however, is often very important. This is the light-spreading effect of an
aperture when the aperture (or object) is illuminated with an infinite source (plane-wave illumination)
and the light is sensed at an infinite distance (far-field) from this aperture.

It is Fraunhofer diffraction that determines the limiting performance of optical systems. Diffraction,
poses a fundamental limitation on any optical system. Diffraction is always present, although its
effects may be masked if the system has significant aberrations. When an optical system is
essentially free from aberrations, its performance is limited solely by diffraction, and it is referred to as
diffraction limited.
Fraunhofer Diffraction by a Circular Aperture

Diffraction pattern (Airy pattern) for a circular aperture

Each ring is separated by a circle of zero intensity. The irradiance distribution in this pattern can be
described by

where I0 = peak irradiance in the image

J1(x) is a Bessel function of the first kind of order unity, and

Where x is the position on the image plane, O is the wavelength, D is the aperture diameter, and T is
the angular radius from pattern maximum. This useful formula shows the far-field irradiance
distribution from a uniformly illuminated circular aperture of diameter, D.

Note: For comparison, the Fraunhoffer diffraction of a uniformly illuminated slit aperture is described
by

Where I0 is the peak irradiance of the image, and


where O is the wavelength, w is the slit width, and T is the angular radius from pattern maximum.

Energy Distribution Table

The table below shows the major features of pure (unaberrated) Fraunhofer diffraction patterns for
circular apertures. The table shows the position, relative intensity, and percentage of total pattern
energy corresponding to each ring or band.

Energy Distribution in the Diffraction Pattern of a Circular Aperture

Circular Aperture
Relative Energy
Position Intensity in Ring
Ring or Band (x) (Ix/I0) (%)

Central Maximum 0.0 1.0 83.8

First Dark 1.22S 0.0

First Bright 1.64S 0.0175 7.2

Second Dark 2.23S 0.0

Second Bright 2.68S 0.0042 2.8

Third Dark 3.24S 0.0

Third Bright 3.70S 0.0016 1.5

Fourth Dark 4.24S 0.0

Fourth Bright 4.71S 0.0008 1.0

Fifth Dark 5.24S 0.0


Writingx = mSthen 

 

ForsmallangleT then

Experiment1

1. Observethediffractionpatternonascreenatasuitabledistance.Photographthe
patternwithadigitalcamera.

Makesurefirstlythatthelaser,focusingmicroscopelensandpinholearealigned
alongtheopticalaxis.Checkthatthelaserisfocusedsharplyonthepinholesothat
mostofthelaserlightpassesthroughthepinhole.

 Uselasergoggleforeyeprotection


2. Setupthedigitalscannertoscancarefullyacrossthepatternforapinholeof100Pm
tocaptureonthecomputertheintensityprofileofthediffractionpattern.
Determinetherelativeintensity Ix/Io.

3. Repeatthescanningprocessforpinholesof50Pmand25Pm.

4. Plotasuitablegraphtoobtainthebestvaluesform for the first dark ring and second
dark ring.


Thepinholeisadelicateprecisionopticalcomponent.

Itcanbedamagedbytouchingwithyourfingersorobjects.

Donotdamagethepinholeinyourhandling.


Experiment2

Placeaconventionallargeapertureafterthepinholetoblockthehigherorderringssothat
onlythecenterAirypatternisprojectedonthescreen.Thisiscommonlyknownasspatial
filteringforobtainingasmoothexpandedlaserbeamwithoutspeckles.

Attachashortsegmentofyourhaironthemetalframeandplaceitclosetothelarge
aperture.Photographthediffractionpatternandexplainthepatternobserved.

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