Diffraction of A Circular Aperture
Diffraction of A Circular Aperture
Diffraction can be understood by considering the wave nature of light. Huygen's principle, illustrated in
the image below, states that each point on a propagating wavefront is an emitter of secondary
wavelets. The combined locus of these expanding wavelets forms the propagating wave. Interference
between the secondary wavelets gives rise to a fringe pattern that rapidly decreases in intensity with
increasing angle from the initial direction of propagation. Huygen's principle nicely describes
diffraction, but rigorous explanation demands a detailed study of wave theory.
Huygen's principle
Diffraction effects are traditionally classified into either Fresnel or Fraunhofer types. Fresnel diffraction
is primarily concerned with what happens to light in the immediate neighborhood of a diffracting object
or aperture. It is thus only of concern when the illumination source is close to this aperture or object.
Consequently, Fresnel diffraction is rarely important in most optical setups.
Fraunhofer diffraction, however, is often very important. This is the light-spreading effect of an
aperture when the aperture (or object) is illuminated with an infinite source (plane-wave illumination)
and the light is sensed at an infinite distance (far-field) from this aperture.
It is Fraunhofer diffraction that determines the limiting performance of optical systems. Diffraction,
poses a fundamental limitation on any optical system. Diffraction is always present, although its
effects may be masked if the system has significant aberrations. When an optical system is
essentially free from aberrations, its performance is limited solely by diffraction, and it is referred to as
diffraction limited.
Fraunhofer Diffraction by a Circular Aperture
Each ring is separated by a circle of zero intensity. The irradiance distribution in this pattern can be
described by
Where x is the position on the image plane, O is the wavelength, D is the aperture diameter, and T is
the angular radius from pattern maximum. This useful formula shows the far-field irradiance
distribution from a uniformly illuminated circular aperture of diameter, D.
Note: For comparison, the Fraunhoffer diffraction of a uniformly illuminated slit aperture is described
by
The table below shows the major features of pure (unaberrated) Fraunhofer diffraction patterns for
circular apertures. The table shows the position, relative intensity, and percentage of total pattern
energy corresponding to each ring or band.
Circular Aperture
Relative Energy
Position Intensity in Ring
Ring or Band (x) (Ix/I0) (%)
ForsmallangleT then
Experiment1
1. Observethediffractionpatternonascreenatasuitabledistance.Photographthe
patternwithadigitalcamera.
Makesurefirstlythatthelaser,focusingmicroscopelensandpinholearealigned
alongtheopticalaxis.Checkthatthelaserisfocusedsharplyonthepinholesothat
mostofthelaserlightpassesthroughthepinhole.
Uselasergoggleforeyeprotection
2. Setupthedigitalscannertoscancarefullyacrossthepatternforapinholeof100Pm
tocaptureonthecomputertheintensityprofileofthediffractionpattern.
Determinetherelativeintensity Ix/Io.
3. Repeatthescanningprocessforpinholesof50Pmand25Pm.
4. Plotasuitablegraphtoobtainthebestvaluesform for the first dark ring and second
dark ring.
Thepinholeisadelicateprecisionopticalcomponent.
Itcanbedamagedbytouchingwithyourfingersorobjects.
Donotdamagethepinholeinyourhandling.
Experiment2
Placeaconventionallargeapertureafterthepinholetoblockthehigherorderringssothat
onlythecenterAirypatternisprojectedonthescreen.Thisiscommonlyknownasspatial
filteringforobtainingasmoothexpandedlaserbeamwithoutspeckles.
Attachashortsegmentofyourhaironthemetalframeandplaceitclosetothelarge
aperture.Photographthediffractionpatternandexplainthepatternobserved.