Wafer manufacturing process

Wafer manufacturing process

• 1.
  Semiconductor Manufacturing Process Fundamental ProcessingSteps: 1.Silicon Manufacturing a) Czochralski method. b) Wafer Manufacturing c) Crystal structure 2.Photolithography a) Photoresists b) Photomask and Reticles c) Patterning
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  3.Oxide Growth &Removal a) Oxide Growth & Deposition b) Oxide Removal c) Other effects d) Local Oxidation 4. Diffusion & Ion Implantation a) Diffusion b) Other effects c) Ion Implantation Semiconductor Manufacturing Process (cont)
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  Crystal Growth andWafer Manufacturing
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  FABRICATING SILICON  Quartz, orSilica, Consists of Silicon Dioxide  Sand Contains Many Tiny Grains of Quartz  Silicon Can be Artificially Produced by Combining Silica and Carbon in Electric Furnice  Gives Polycrystalline Silicon (multitude of crystals)  Practical Integrated Circuits Can Only be Fabricated from Single-Crystal Material
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  CRYSTAL GROWTH  Czochralski Process isa Technique in Making Single-Crystal Silicon  A Solid Seed Crystal is Rotated and Slowly Extracted from a Pool of Molten Si  Requires Careful Control to Give Crystals Desired Purity and Dimensions
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  CYLINDER OF MONOCRYSTALLINE  The SiliconCylinder is Known as an Ingot  Typical Ingot is About 1 or 2 Meters in Length  Can be Sliced into Hundreds of Smaller Circular Pieces Called Wafers  Each Wafer Yields Hundreds or Thousands of Integrated Circuits
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  WAFER MANUFACTURING  The SiliconCrystal is Sliced by Using a Diamond-Tipped Saw into Thin Wafers  Sorted by Thickness  Damaged Wafers Removed During Lapping  Etch Wafers in Chemical to Remove any Remaining Crystal Damage  Polishing Smoothes Uneven Surface Left by Sawing Process
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  Silicon Manufacturing Photolithography
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  Photolithography Photolithography is a techniquethat is used to define the shape of micro-machined structures on a wafer.
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  Photolithography Photoresist The first stepin the photolithography process is to develop a mask, which will be typically be a chromium pattern on a glass plate. Next, the wafer is then coated with a polymer which is sensitive to ultraviolet light called a photoresist. Afterward, the photoresist is then developed which transfers the pattern on the mask to the photoresist layer.
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  Photo resist CoatingProcesses p- epi p+ substrate field oxide photoresist Photoresists Negative Photoresist * Positive Photoresist * Inert Gases Ar N2
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  Photolithography Photoresist There are twobasic types of Photoresists Positive and Negative. Positive resists. Positive resists decomposes ultraviolet light. The resist is exposed with UV light wherever the underlying material is to be removed. In these resists, exposure to the UV light changes the chemical structure of the resist so that it becomes more soluble in the developer. The exposed resist is then washed away by the developer solution, leaving windows of the bare underlying material. The mask, therefore, contains an exact copy of the pattern which is to remain on the wafer.
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  Photolithography Photoresist Negative resists Exposure tothe UV light causes the negative resist to become polymerized, and more difficult to dissolve. Therefore, the negative resist remains on the surface wherever it is exposed, and the developer solution removes only the unexposed portions. Masks used for negative photoresists, therefore, contain the inverse (or photographic "negative") of the pattern to be transferred.
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  Photolithography Model  Figure 1a showsa thin film of some material (eg, silicon dioxide) on a substrate of some other material (eg, a silicon wafer).  Photoresist layer (Figure 1b )  Ultraviolet light is then shone through the mask onto the photoresist (figure 1c).
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  Photolithography Model (cont)  The photoresistis then developed which transfers the pattern on the mask to the photoresist layer (figure 1d).  A chemical (or some other method) is then used to remove the oxide where it is exposed through the openings in the resist (figure 1e).  Finally the resist is removed leaving the patterned oxide (figure 1f).
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  Photolithography Photomasks and Reticles Photomask Thisis a square glass plate with a patterned emulsion of metal film on one side. The mask is aligned with the wafer, so that the pattern can be transferred onto the wafer surface. Each mask after the first one must be aligned to the previous pattern.
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  Photolithography Photomasks and Reticles Whena image on the photomask is projected several time side by side onto the wafer, this is known as stepping and the photomask is called a reticle. An common reticle is the 5X The patterns on the 5X reticle are reduced 5 times when projected onto the wafer. This means the dies on the photomask are 5 times larger than they are on the final product. There are other kinds of reduction reticles (2X, 4X, and 10X), but the 5X is the most commonly used. Reduction reticles are used on a variety of steppers, the most common being ASM, Canon, Nikon, and GCA.
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  Ion Implantation Thin Films Photo- lithography Cleaning Front-End Processes Etch Ion Implantation Planarization Test& Assembly Design Wafer Preparation • Well Implants • Channel Implants • Source/Drain Implants
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  Ion Implantation 180 kV Resolving Aperture IonSource Equipment Ground Acceleration Tube 90° Analyzing Magnet Terminal Ground 20 kV Focus Neutral beam and beam path gated Beam trap and gate plate Wafer in wafer process chamber X - axis scanner Y - axis scanner Neutral beam trap and beam gate Gases Ar AsH3 B11 F3 * He N2 PH3 SiH4 SiF4 GeH4 Solids Ga In Sb Liquids Al(CH3)3 * High proportion of the total product use junction depth p- epi p+ substrate field oxide photoresist mask n-w ell p-channel transistor phosphorus (-) ions Process Conditions Flow Rate: 5 sccm Pressure: 10-5 Torr Accelerating Voltage: 5 to 200 keV