DENSITY CHECKS
-CVN REDDY SEELM
Density Checks
1. Introduction to Density Checks
In modern VLSI design and fabrication, density checks play a critical role in ensuring
that the integrated circuit (IC) layout adheres to uniformity constraints, both locally and
globally. Density rules are verified during the physical verification stage to avoid
manufacturing problems caused by uneven material deposition or removal during
fabrication processes such as chemical-mechanical polishing (CMP), etching, and
deposition
2. Why Density is Important in Fabrication
Fabrication is a highly precise and sensitive process. Semiconductor wafers go through
a variety of steps such as etching, ion implantation, and planarization. These processes
are susceptible to layout density variations:
2.1 Chemical Mechanical Polishing (CMP) Issues
CMP is used to flatten layers during the fabrication process. If certain areas of the chip
have too much metal (high density) while others have very little (low density), it leads
to:
• Over-polishing (erosion) in high-density regions
• Under-polishing (dishing) in low-density regions
These defects can result in:
• Non-uniform topography
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• Poor metal coverage
• Open or short circuits
• Yield loss and device failure
2.2 Etching and Deposition Uniformity
Density impacts how etching and deposition work:
• Dense regions might not etch completely
• Sparse regions may face over-etching or under-deposition
• Maintaining a balance ensures process uniformity and reliable pattern transfer
onto silicon wafers.
3. Types of Density Rules
Density checks can be categorized as:
3.1 Global Density Rules
These ensure the entire chip maintains a specific average metal density (e.g., 30%–70%)
to meet process uniformity.
3.2 Local Density Rules
These focus on smaller areas like a 100µm × 100µm window, ensuring density variations
are within limits, especially critical for localized CMP effects.
3.3 Edge and Corner Density
Special rules to manage density near die edges and corners due to etching and polishing
non-uniformity at boundaries.
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4. Layout Design Strategies to Handle Density
Designers need to adopt smart layout techniques to meet density requirements:
4.1 Use of Dummy Fill Structures
Dummy or "fill" patterns are added in regions with lower metal density to bring it within
acceptable limits. These do not serve electrical functions but help in process uniformity.
4.2 Smart Placement and Routing
• Distribute logic gates uniformly
• Avoid clustering too many interconnects in one region
• Ensure power grid and routing structures contribute positively to density balance
4.3 Density-aware Floorplanning
Even during chip floorplanning, care is taken to distribute functional blocks evenly
across the die to maintain uniform metal usage.
5. What are Fill Decks?
A Fill Deck is a specially designed script or rule file used in physical verification tools
(like Calibre, ICV, Pegasus) to add dummy metal structures (fills) automatically during
sign-off or pre-tapeout stages.
5.1 Purpose of Fill Decks
• Ensure local and global metal density compliance
• Automate dummy fill insertion
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• Maintain electrical isolation (fill must not create shorts)
• Optimize performance and yield
5.2 How They Work
Fill decks use layout pattern analysis to detect low-density areas and then insert dummy
fill patterns (e.g., metal rectangles, poly fills) based on:
• Minimum spacing from active nets
• Maximum fill size allowed
• Layer-specific density targets
• Some tools also allow fill exclusion zones to prevent fill insertion in sensitive
areas (e.g., analog blocks).
6. Physical Verification: Density Rule Checks
After fill insertion, Density Rule Check (DRC) is performed as part of the Physical
Verification stage. The rule deck will:
• Slide a checking window (e.g., 100µm × 100µm) across the entire chip
• Calculate metal coverage in each window
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• Compare it with min/max allowable density thresholds
• Flag violations if any window exceeds limits
• Tools like Calibre or ICV report these violations along with coordinates and
suggest modifications.
7. Examples and Illustration
Example 1: Metal Density Problem
A layout contains a large logic block with dense interconnects and an adjacent empty
space reserved for I/O pads. The empty region causes local density failure. To fix this:
• Fill deck inserts dummy metal rectangles in the empty region.
• These fills help maintain density between 30%–70%.
Example 2: Fill-Induced Parasitics
Although fills are electrically inactive, they may introduce unintended parasitic
capacitance. Tools optimize fill spacing from signal nets to reduce such side effects.
8. Conclusion
Density checks are fundamental to bridging the design and manufacturing divide. They
ensure process reliability and yield by balancing metal coverage across the die. Layout
designers and physical verification engineers must collaborate to:
• Understand density requirements
• Use fill decks wisely
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• Achieve design goals without compromising manufacturability
By proactively addressing density issues during layout design, teams can significantly
reduce fabrication defects and increase chip yield and performance.
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Thank You
The VLSI Voyager
-C.V.N Reddy Seelam